Improved hydrogen ionization rate in enhanced glow discharge plasma immersion ion implantation by enlarging the interaction path using an insulating tube

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Zhuo Wang
  • Ying Zhu
  • Liu He Li
  • Qiu Yuan Lu
  • Fu Shun He
  • Dan Dan Dun
  • Fen Li
  • Ricky K. Y. Fu

Detail(s)

Original languageEnglish
Article number23503
Journal / PublicationReview of Scientific Instruments
Volume82
Issue number2
Publication statusPublished - Feb 2011

Abstract

A small pointed hollow anode and large tabular cathode are used in enhanced glow discharge plasma immersion ion implantation (EGD-PIII). Electrons are repelled from the substrate by the electric field formed by the negative voltage pulses and concentrate in the vicinity of the anode to enhance the self-glow discharge process. To extend the application of EGD-PIII to plasma gases with low ionization rates, an insulating tube is used to increase the interaction path for electrons and neutrals in order to enhance the discharge near the anode. Results obtained from numerical simulation based on the particle-in-cell code, finite element method, and experiments show that this configuration enhances the ionization rate and subsequent ion implant fluence. The process is especially suitable for gases that have low ionization rates such as hydrogen and helium. © 2011 American Institute of Physics.

Citation Format(s)

Improved hydrogen ionization rate in enhanced glow discharge plasma immersion ion implantation by enlarging the interaction path using an insulating tube. / Wang, Zhuo; Zhu, Ying; Li, Liu He; Lu, Qiu Yuan; He, Fu Shun; Dun, Dan Dan; Li, Fen; Fu, Ricky K. Y.; Chu, Paul K.

In: Review of Scientific Instruments, Vol. 82, No. 2, 23503, 02.2011.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review