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Improved electroluminescence from n-ZnO/AlN/p-GaN heterojunction light-emitting diodes

  • J. B. You
  • , X. W. Zhang
  • , S. G. Zhang
  • , J. X. Wang
  • , Z. G. Yin
  • , H. R. Tan
  • , W. J. Zhang
  • , P. K. Chu
  • , B. Cui
  • , A. M. Wowchak
  • , A. M. Dabiran
  • , P. P. Chow

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    n-ZnO/p-GaN heterojunction light-emitting diodes with and without a sandwiched AlN layer were fabricated. The electroluminescence (EL) spectrum acquired from the n-ZnO/p-GaN displays broad emission at 650 nm originating from ZnO and weak emission at 440 nm from GaN, whereas the n-ZnO/AlN/p-GaN exhibits strong violet emission at 405 nm from ZnO without GaN emission. The EL intensity is greatly enhanced by inserting a thin AlN intermediate layer and it can be attributed to the suppressed formation of the GaOx interfacial layer and confinement effect rendered by the AlN potential barrier layer. © 2010 American Institute of Physics.
    Original languageEnglish
    Article number201102
    JournalApplied Physics Letters
    Volume96
    Issue number20
    DOIs
    Publication statusPublished - 17 May 2010

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