Imprinting polymer film on patterned substrates

L. Tan; Y. P. Kong; L. R. Bao; X. D. Huang; L. J. Guo; S. W. Pang; A. F. Yee

doi:10.1116/1.1624258

Imprinting polymer film on patterned substrates

L. Tan
, Y. P. Kong
, L. R. Bao
, X. D. Huang
, L. J. Guo
, S. W. Pang
, A. F. Yee

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

33 Citations (Scopus)

Abstract

A technique to create polymer film patterns on substrates with microstructures with an elastomeric polydimethylsiloxane (PDMS) pad was discussed. The pad surface was coated with either a continuous or patterned polymer film. The results show that deformation of PDMS during the imprinting process was restricted by the polymer film being coated on top. It was also found that the addition of plasticizers to the polymer film facilitated pattern creation at a lower temperature and pressure.

Original language	English
Pages (from-to)	2742-2748
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1624258
Publication status	Published - Nov 2003
Externally published	Yes

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title = "Imprinting polymer film on patterned substrates",

abstract = "A technique to create polymer film patterns on substrates with microstructures with an elastomeric polydimethylsiloxane (PDMS) pad was discussed. The pad surface was coated with either a continuous or patterned polymer film. The results show that deformation of PDMS during the imprinting process was restricted by the polymer film being coated on top. It was also found that the addition of plasticizers to the polymer film facilitated pattern creation at a lower temperature and pressure.",

author = "L. Tan and Kong, \{Y. P.\} and Bao, \{L. R.\} and Huang, \{X. D.\} and Guo, \{L. J.\} and Pang, \{S. W.\} and Yee, \{A. F.\}",

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language = "English",

volume = "21",

pages = "2742--2748",

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T1 - Imprinting polymer film on patterned substrates

AU - Tan, L.

AU - Kong, Y. P.

AU - Bao, L. R.

AU - Huang, X. D.

AU - Guo, L. J.

AU - Pang, S. W.

AU - Yee, A. F.

PY - 2003/11

Y1 - 2003/11

N2 - A technique to create polymer film patterns on substrates with microstructures with an elastomeric polydimethylsiloxane (PDMS) pad was discussed. The pad surface was coated with either a continuous or patterned polymer film. The results show that deformation of PDMS during the imprinting process was restricted by the polymer film being coated on top. It was also found that the addition of plasticizers to the polymer film facilitated pattern creation at a lower temperature and pressure.

AB - A technique to create polymer film patterns on substrates with microstructures with an elastomeric polydimethylsiloxane (PDMS) pad was discussed. The pad surface was coated with either a continuous or patterned polymer film. The results show that deformation of PDMS during the imprinting process was restricted by the polymer film being coated on top. It was also found that the addition of plasticizers to the polymer film facilitated pattern creation at a lower temperature and pressure.

UR - https://www.scopus.com/pages/publications/0942300056

UR - https://www.scopus.com/pages/publications/0942300056#tab=impact

U2 - 10.1116/1.1624258

DO - 10.1116/1.1624258

M3 - RGC 21 - Publication in refereed journal

SN - 0734-211X

VL - 21

SP - 2742

EP - 2748

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Imprinting polymer film on patterned substrates

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