Imprinting of polymer at low temperature and pressure

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

33 Scopus Citations
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Detail(s)

Original languageEnglish
Pages (from-to)2486-2492
Journal / PublicationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number5
Publication statusPublished - Sept 2004
Externally publishedYes

Abstract

A method of imprinting polymer materials at low temperature and low pressure was discussed. Patterned or flat Si substrates, along with poly(dimethylsiloxane) (PDMS) molds and ink pads were used for imprinting. The imprinted profiles of these polymer films were then examined by contact mode atomic force microscopy (AFM) and scanning electron microscopy (SEM). It was found that the addition of plasticizers increased the chain mobility of polymers and lowered the imprinting temperature and/or pressure.