Imprinting of polymer at low temperature and pressure
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 2486-2492 |
Journal / Publication | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 22 |
Issue number | 5 |
Publication status | Published - Sept 2004 |
Externally published | Yes |
Link(s)
Abstract
A method of imprinting polymer materials at low temperature and low pressure was discussed. Patterned or flat Si substrates, along with poly(dimethylsiloxane) (PDMS) molds and ink pads were used for imprinting. The imprinted profiles of these polymer films were then examined by contact mode atomic force microscopy (AFM) and scanning electron microscopy (SEM). It was found that the addition of plasticizers increased the chain mobility of polymers and lowered the imprinting temperature and/or pressure.
Citation Format(s)
Imprinting of polymer at low temperature and pressure. / Tan, L.; Kong, Y. P.; Pang, S. W. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 5, 09.2004, p. 2486-2492.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 5, 09.2004, p. 2486-2492.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review