Implantation of carbon in GaAs and compensating native defects

Amy J. Moll, Joel W. Ager III, Man Yu Kin, Wladek Walukiewicz, Eugene E. Haller

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

The effects of co-implantation on the electrical activity of C acceptors have been studied using a series of elements as co-implants. A variety of electrical and structural techniques were used for characterization. It is found that although co-implantation with heavy ions improves the substitutionality of C atoms on As sites, a high electrical activity of the C As acceptors is attained only if the stoichiometry is maintained through co-implantation of group III atoms.
Original languageEnglish
Pages (from-to)1535-1540
JournalMaterials Science Forum
Volume143-4
Issue numberpt 3
DOIs
Publication statusPublished - 1994
Externally publishedYes
EventProceedings of the 17th International Conference on Defects in Semiconductors. Part 1 (of 3) - Gmunden, Austria
Duration: 18 Jul 199323 Jul 1993

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