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In situ TEM revealing pretreatment and interface effects in Ge2Sb2Te5

  • Ruiwen Shao
  • , Lihua Wang
  • , Weikang Dong
  • , Lixin Yao
  • , Yongjin Chen
  • , Lixin Dong
  • , Kun Zheng*
  • , Xiaodong Han*
  • *Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

45 Downloads (CityUHK Scholars)

Abstract

Random access memory devices that rely on phase changes are primarily limited by the speed of crystallization. However, imaging structural dynamics in working devices with nanoscale resolution remains elusive. Using an ultrafast liquid-quenching system in transmission electron microscope, we obtain a melt-quenched amorphous phase-change material Ge2Sb2Te5 nanosheet. We find that the applied incubation field (pretreatment) leads to nonuniform nucleus formation and growth in the amorphous Ge2Sb2Te5, accompanied by a slight change in electric properties. Moreover, the phase-change mechanism changes from the material inherent crystallization mechanism (nucleation-dominated) to the heterocrystallization mechanism, indicating the incubation period of nucleation might be bypassed.
Original languageEnglish
Article number222105
JournalApplied Physics Letters
Volume116
Issue number22
DOIs
Publication statusPublished - 1 Jun 2020

Research Keywords

  • PHASE-CHANGE MATERIALS
  • ELECTRON-MICROSCOPY
  • CRYSTAL NUCLEATION
  • CRYSTALLIZATION
  • MEMORY

Publisher's Copyright Statement

  • COPYRIGHT TERMS OF DEPOSITED FINAL PUBLISHED VERSION FILE: This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Ruiwen Shao, Lihua Wang, Weikang Dong, Lixin Yao, Yongjin Chen, Lixin Dong, Kun Zheng, and Xiaodong Han , "In situ TEM revealing pretreatment and interface effects in Ge2Sb2Te5", Appl. Phys. Lett. 116, 222105 (2020) and may be found at https://doi.org/10.1063/5.0007124.

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