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In situ characterization of Ge nanocrystals near the growth temperature

I. D. Sharp, Q. Xu, D. O. Yi, C. Y. Liao, J. W. Beeman, Z. Liliental-Weber, K. M. Yu, D. N. Zakharov, J. W. Ager III, D. C. Chrzan, E. E. Haller

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

We present in situ electron diffraction data indicating that Ge nanocrystals embedded in a silica matrix can be solid at temperatures exceeding the bulk Ge melting point. Supercooling is observed when returning from temperatures above the melting point of the Ge nanocrystals. Since melting point hysteresis is observed, it is not clear if nanoclusters are solid or liquid during the initial growth process. Raman spectra of as-grown nanocrystals give a measure of compressive stress and in-situ Raman spectroscopy further confirms the presence of crystalline Ge above 800 °C. © 2005 American Institute of Physics.
Original languageEnglish
Title of host publicationPHYSICS OF SEMICONDUCTORS
Subtitle of host publication27th International Conference on the Physics of Semiconductors
EditorsJosé Menéndez, Chris G. Van de Walle
PublisherAmerican Institute of Physics
Pages611-612
ISBN (Print)0735402574, 9780735402577
DOIs
Publication statusPublished - 30 Jun 2005
Externally publishedYes
Event27th International Conference on the Physics of Semiconductors (ICPS 27) - Flagstaff, AZ, United States
Duration: 26 Jul 200430 Jul 2004

Publication series

NameAIP Conference Proceedings
Volume772
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference27th International Conference on the Physics of Semiconductors (ICPS 27)
PlaceUnited States
CityFlagstaff, AZ
Period26/07/0430/07/04

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