Identification of the dominant diffusing species in silicide formation

W. K. Chu; H. Kraütle; J. W. Mayer; H. Müller; M. A. Nicolet; K. N. Tu

doi:10.1063/1.1655546

Identification of the dominant diffusing species in silicide formation

W. K. Chu
, H. Kraütle
, J. W. Mayer
, H. Müller
, M. A. Nicolet
, K. N. Tu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

108 Citations (Scopus)

Abstract

Implanted noble gas atoms of Xe have been used as diffusion markers in the growth study of three silicides: Ni₂Si, VSi₂, and TiSi₂. Backscattering of MeV He has been used to determine the displacement of the markers. We found that while Si atoms predominate the diffusion in VSi₂ and TiSi₂, Ni atoms are the faster moving species in Ni₂Si. © 1974 American Institute of Physics.

Original language	English
Pages (from-to)	454-457
Journal	Applied Physics Letters
Volume	25
Issue number	8
DOIs	https://doi.org/10.1063/1.1655546
Publication status	Published - 1974
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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@article{9a66c8560af447c98839a12f2fd11dbb,

title = "Identification of the dominant diffusing species in silicide formation",

abstract = "Implanted noble gas atoms of Xe have been used as diffusion markers in the growth study of three silicides: Ni2Si, VSi2, and TiSi2. Backscattering of MeV He has been used to determine the displacement of the markers. We found that while Si atoms predominate the diffusion in VSi2 and TiSi2, Ni atoms are the faster moving species in Ni2Si. {\textcopyright} 1974 American Institute of Physics.",

author = "Chu, \{W. K.\} and H. Kra{\"u}tle and Mayer, \{J. W.\} and H. M{\"u}ller and Nicolet, \{M. A.\} and Tu, \{K. N.\}",

note = "Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].",

year = "1974",

doi = "10.1063/1.1655546",

language = "English",

volume = "25",

pages = "454--457",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Identification of the dominant diffusing species in silicide formation

AU - Chu, W. K.

AU - Kraütle, H.

AU - Mayer, J. W.

AU - Müller, H.

AU - Nicolet, M. A.

AU - Tu, K. N.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 1974

Y1 - 1974

N2 - Implanted noble gas atoms of Xe have been used as diffusion markers in the growth study of three silicides: Ni2Si, VSi2, and TiSi2. Backscattering of MeV He has been used to determine the displacement of the markers. We found that while Si atoms predominate the diffusion in VSi2 and TiSi2, Ni atoms are the faster moving species in Ni2Si. © 1974 American Institute of Physics.

AB - Implanted noble gas atoms of Xe have been used as diffusion markers in the growth study of three silicides: Ni2Si, VSi2, and TiSi2. Backscattering of MeV He has been used to determine the displacement of the markers. We found that while Si atoms predominate the diffusion in VSi2 and TiSi2, Ni atoms are the faster moving species in Ni2Si. © 1974 American Institute of Physics.

UR - https://www.scopus.com/pages/publications/11744381998

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-11744381998&origin=recordpage

U2 - 10.1063/1.1655546

DO - 10.1063/1.1655546

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 25

SP - 454

EP - 457

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -

Identification of the dominant diffusing species in silicide formation

Abstract

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