Hybrid evaporation : Glow discharge source for plasma immersion ion implantation
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 4301-4304 |
| Journal / Publication | Review of Scientific Instruments |
| Volume | 74 |
| Issue number | 10 |
| Publication status | Published - Oct 2003 |
Link(s)
Abstract
A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.
Citation Format(s)
Hybrid evaporation : Glow discharge source for plasma immersion ion implantation. / Li, L. H.; Poon, R. W Y; Kwok, S. C H et al.
In: Review of Scientific Instruments, Vol. 74, No. 10, 10.2003, p. 4301-4304.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
