Hybrid evaporation : Glow discharge source for plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • L. H. Li
  • R. W Y Poon
  • S. C H Kwok
  • Y. Q. Wu
  • Y. H. Zhang

Detail(s)

Original languageEnglish
Pages (from-to)4301-4304
Journal / PublicationReview of Scientific Instruments
Volume74
Issue number10
Publication statusPublished - Oct 2003

Abstract

A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.

Citation Format(s)

Hybrid evaporation : Glow discharge source for plasma immersion ion implantation. / Li, L. H.; Poon, R. W Y; Kwok, S. C H; Chu, P. K.; Wu, Y. Q.; Zhang, Y. H.

In: Review of Scientific Instruments, Vol. 74, No. 10, 10.2003, p. 4301-4304.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review