HRTEM study of atomic faceting interfaces of Σ=3 NiSi2/Si on (011)Si substrate

W. J. Chen, F. R. Chen

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

1 Citation (Scopus)

Abstract

The NiSi2 thin film grown on the (11̄0) Si substrate was examined and the Σ=3 NiSi2(1̄11̄)/(1̄11) and NiSi2(11̄5)/(1̄11) Si microfacets were found. The chain unit model was examined in the NiSi2(11̄5)/(1̄11) Si interface and compared with the NiSi2(1̄11)/(11̄5) Si interface in the previous case. Two different domain related atomic faceting structures of the NiSi2(11̄5)/(1̄11) Si interface were found. Finally, the indications of these results were discussed.
Original languageEnglish
Pages (from-to)135-142
JournalMaterials Science Forum
Volume189-190
Online publishedJul 1995
DOIs
Publication statusPublished - 1995
Externally publishedYes
Event2nd International Conference on the Role of Interfaces in Advanced Materials Design, Processing and Performance - Ballarat, Australia
Duration: 1 Nov 19935 Nov 1993

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