How surface roughness affects the angular dependence of the sputtering yield

A. Hu; A. Hassanein

doi:10.1016/j.nimb.2012.03.026

Author(s)

A. Hu
A. Hassanein

Detail(s)

Original language	English
Pages (from-to)	15-20
Journal / Publication	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	281
Publication status	Published - 15 Jun 2012
Externally published	Yes

Link(s)

DOI	DOI https://doi.org/10.1016/j.nimb.2012.03.026 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-84861159766&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(80293bba-719c-4203-8c14-10effd409e42).html

Abstract

Comprehensive model is developed to study the impact of surface roughness on the angular dependence of sputtering yield. Instead of assuming surfaces to be flat or composed of exact self-similar fractals, we developed a new method to describe the surfaces. Random fractal surfaces generated by midpoint displacement algorithm in computer graphics area and Support vector machine algorithm in pattern recognition area are combined with the Monte Carlo ion bombardment simulation code, i.e., Ion Transport in Materials and Compounds (ITMC) code [1]. With this new fractal version of ITMC-F, we successfully simulated the angular dependence of sputtering yield for various ion-target combinations. Examples are given for 5 keV Ar ions bombarding iron, graphite, and silicon surfaces, with the input surface roughness exponent directly depicted from experimental data. Comparison is made with previous models to account for surface roughness and recent experimental data. The ITMC-F code showed good agreement with the experimental data. © 2012 Elsevier B.V. All rights reserved.

Research Area(s)

Angular sputtering, ITMC code, Random fractal, Roughness exponent

Citation Format(s)

[ RIS ] [ BibTeX ]

How surface roughness affects the angular dependence of the sputtering yield. / Hu, A.; Hassanein, A.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 281, 15.06.2012, p. 15-20.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Hu, A & Hassanein, A 2012, 'How surface roughness affects the angular dependence of the sputtering yield', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 281, pp. 15-20. https://doi.org/10.1016/j.nimb.2012.03.026

Hu, A., & Hassanein, A. (2012). How surface roughness affects the angular dependence of the sputtering yield. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 281, 15-20. https://doi.org/10.1016/j.nimb.2012.03.026

Hu A, Hassanein A. How surface roughness affects the angular dependence of the sputtering yield. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2012 Jun 15;281:15-20. doi: 10.1016/j.nimb.2012.03.026

Hu, A. ; Hassanein, A. / How surface roughness affects the angular dependence of the sputtering yield. In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2012 ; Vol. 281. pp. 15-20.