High voltage pulser with a fast fall-time for plasma immersion ion implantation

Zongtao Zhu; Chunzhi Gong; Xiubo Tian; Shiqin Yang; Ricky K. Y. Fu; Paul K. Chu

doi:10.1063/1.3575320

Author(s)

Zongtao Zhu
Chunzhi Gong
Xiubo Tian
Shiqin Yang
Ricky K. Y. Fu

Detail(s)

Original language	English
Article number	45102
Journal / Publication	Review of Scientific Instruments
Volume	82
Issue number	4
Publication status	Published - Apr 2011

Link(s)

DOI	DOI https://doi.org/10.1063/1.3575320 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-79955617677&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(bf0fbed9-7782-4cf2-b53c-dee3c0a68319).html

Abstract

A novel high voltage (HV) modulator that offers a short fall time to minimize sputtering effects and allow more precise control of the incident ion fluence in plasma immersion ion implantation is described. The use of 36 insulated-gate bipolar transistors in the 30 kV hard-tube pulser reduces the HV fall time to 3.5 s, compared to a fall time of 80 s if a pull-down resister is used. The voltage balance is achieved by a voltage-balancing resistor, clamped capacitance, and the synchronization of drive signals. Compared to the traditional method employing a pull-down resister or an additional hard tube, our design consumes less power and is more economical and reliable. © 2011 American Institute of Physics.

Citation Format(s)

[ RIS ] [ BibTeX ]

High voltage pulser with a fast fall-time for plasma immersion ion implantation. / Zhu, Zongtao; Gong, Chunzhi; Tian, Xiubo et al.
In: Review of Scientific Instruments, Vol. 82, No. 4, 45102, 04.2011.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Zhu, Z, Gong, C, Tian, X, Yang, S, Fu, RKY & Chu, PK 2011, 'High voltage pulser with a fast fall-time for plasma immersion ion implantation', Review of Scientific Instruments, vol. 82, no. 4, 45102. https://doi.org/10.1063/1.3575320

Zhu, Z., Gong, C., Tian, X., Yang, S., Fu, R. K. Y., & Chu, P. K. (2011). High voltage pulser with a fast fall-time for plasma immersion ion implantation. Review of Scientific Instruments, 82(4), Article 45102. https://doi.org/10.1063/1.3575320

Zhu Z, Gong C, Tian X, Yang S, Fu RKY, Chu PK. High voltage pulser with a fast fall-time for plasma immersion ion implantation. Review of Scientific Instruments. 2011 Apr;82(4):45102. doi: 10.1063/1.3575320

Zhu, Zongtao ; Gong, Chunzhi ; Tian, Xiubo et al. / High voltage pulser with a fast fall-time for plasma immersion ion implantation. In: Review of Scientific Instruments. 2011 ; Vol. 82, No. 4.