High-temperature reactive wetting systems: Role of lattice constant

Shao-Yu Wang, Shuo-Lin Wang, Yan-Ru Yang, Xiao-Dong Wang*, Duu-Jong Lee*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

23 Citations (Scopus)

Abstract

The high-temperature spreading dynamics of Al-Cu(l)/Ni(s) and Al-Ni(l)/Ni(s) wetting systems was studied using molecular dynamics simulations. Accompanied with spreading, a significant dissolution reaction was noted to take place for the two studied systems. The dissolution reaction involves both diffusion of solid atoms into the droplet and incorporation of liquid atoms into the substrate. No precursor film is generated during spreading, since its formation is suppressed by the dissolution reaction. The dissolution reaction induces an enhanced spreading rate, and spreading becomes faster when droplets contain less Cu or Ni atoms. The dissolution of solid atoms into the droplet is faster than that of liquid atoms into the substrate, so that the dissolution of the former is the dominant driving force for the spreading enhancement. The spreading of Al-Cu droplets correlates with that of Al-Ni droplets so long as the Cu concentration in Al-Cu droplets is equal to the Ni concentration in Al-Ni droplets, since both Cu and Ni atoms have the identical lattice constants.
Original languageEnglish
Article number115206
JournalChemical Engineering Science
Volume209
Online published5 Sept 2019
DOIs
Publication statusPublished - 14 Dec 2019
Externally publishedYes

Research Keywords

  • Dissolution
  • Dynamic contact angle
  • High temperature
  • Molecular dynamics simulations
  • Spreading mechanism

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