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High temperature in-situ phase stability of sputtered TiAlxN coatings

  • Shyam Bharatkumar Patel
  • , Ehsan Mohammadpour
  • , Nicholas Mondinos
  • , Xiaoli Zhao
  • , Jean-Pierre Veder
  • , Zhi-feng Zhou
  • , T.S.Y. Moh
  • , Willey Yun Hsien Liew
  • , Sunghwan Lee
  • , Zhong-Tao Jiang*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

The temperature dependence of phase composition and lattice parameters, for TiAlxN thin film coating, are experimentally investigated by in-situ synchrotron radiation X-ray diffraction (SR-XRD), at temperatures between 25 °C and 700 °C. Mechanical properties, such as: Young's modulus (E), hardness (H) and plastic deformation index (PDI) – were experimentally determined by nanoindentation, at 25 °C. Crystalline structural analysis, of SR-XRD results, indicates the major phases are TiN and AlN; with Ti2O and TiO2 phases also present above 600 °C. The lattice constants increased with an increase in temperature. Atomic and phase compositions, at 25 °C, were also verified by X-ray photoelectron spectroscopy (XPS). Field emission scanning electron microscopy (FESEM) images display an increase in surface roughness and reduction in grain size, with increasing Aluminium percentage (Al%). Nanoindentation analysis showed a maximum hardness of 25.1 ± 1.5 GPa (sample containing 12% Al), which was subsequently reduced upon addition of more Aluminium. Finite element modelling (FEM), including von Mises stress distribution, indicates lower mechanical integrity, for samples with high Al% content.
Original languageEnglish
Pages (from-to)507-514
JournalJournal of Alloys and Compounds
Volume786
Online published1 Feb 2019
DOIs
Publication statusPublished - 25 May 2019

Research Keywords

  • Finite element modelling
  • Hard coating
  • High temperature SR-XRD
  • Nanoindentation
  • TiAlxN thin film
  • von Mises stress distribution

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