High Dose and Uniform Hydrogen Ion Implantation into Silicon by Enhanced Glow Discharge Plasma Immersion Ion Implantation

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Publication status	Published - 7 Jun 2010
Event	European Materials Research Society Spring Meeting (E-MRS) - Strasbourg, France Duration: 7 Jun 2010 → 11 Jun 2010

Conference	European Materials Research Society Spring Meeting (E-MRS)
Place	France
City	Strasbourg
Period	7/06/10 → 11/06/10

Other Access Options

@conference{81dd41d4c3b943bfa6091db82957f976,

title = "High Dose and Uniform Hydrogen Ion Implantation into Silicon by Enhanced Glow Discharge Plasma Immersion Ion Implantation",

author = "LU, \{Q Y\} and LI, \{L H\} and Z WANG and L GUAN and Paul CHU",

year = "2010",

month = jun,

day = "7",

language = "English",

note = "European Materials Research Society Spring Meeting (E-MRS) ; Conference date: 07-06-2010 Through 11-06-2010",

}

High Dose and Uniform Hydrogen Ion Implantation into Silicon by Enhanced Glow Discharge Plasma Immersion Ion Implantation. / LU, Q Y; LI, L H; WANG, Z et al.
2010. Paper presented at European Materials Research Society Spring Meeting (E-MRS), Strasbourg, France.

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

TY - CONF

T1 - High Dose and Uniform Hydrogen Ion Implantation into Silicon by Enhanced Glow Discharge Plasma Immersion Ion Implantation

AU - LU, Q Y

AU - LI, L H

AU - WANG, Z

AU - GUAN, L

AU - CHU, Paul

PY - 2010/6/7

Y1 - 2010/6/7

M3 - RGC 32 - Refereed conference paper (without host publication)

T2 - European Materials Research Society Spring Meeting (E-MRS)

Y2 - 7 June 2010 through 11 June 2010

ER -