High-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics

X. D. Bai, C. Y. Zhi, S. Liu, E. G. Wang, Z. L. Wang

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

33 Citations (Scopus)

Abstract

High-density (∼ 108/cm2), uniformly aligned silicon nanotip arrays are synthesized by a plasma-assisted hot-filament chemical vapor deposition process using mixed gases composed of hydrogen, nitrogen and methane. The silicon nanotips grow along 〈112〉, and are coated in situ with a ∼ 3 nm thick amorphous carbon film by increasing the methane concentration in the source gases. In comparison to the uncoated silicon nanotips arrays, the coated tips have enhanced field emission properties with a turn-on field of 1.6 V/μm (for 10 μA/cm2) and threshold field of 3 V/μm (for 10 mA/cm2), suggesting their potential applications for flat panel displays. © 2003 Elsevier Science Ltd. All rights reserved.
Original languageEnglish
Pages (from-to)185-188
JournalSolid State Communications
Volume125
Issue number3-4
DOIs
Publication statusPublished - Jan 2003
Externally publishedYes

Research Keywords

  • A. Semiconductor
  • D. Electronic transport

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