Abstract
Nanocrystalline tantalum thin film was prepared by radio frequency magnetron sputtering on a glass substrate. The structure and mechanical properties of the as-deposited thin film were investigated by X-ray diffraction, transmission electron microscopy, and nanoindentation. The salient feature in the present tantalum thin film with a grain size of 76.5 nm is the remarkable enhancement of hardness, being about one order of magnitude higher than that of bulk coarse-grained tantalum.
| Original language | English |
|---|---|
| Pages (from-to) | 1227-1230 |
| Journal | Scripta Materialia |
| Volume | 54 |
| Issue number | 7 |
| Online published | 19 Jan 2006 |
| DOIs | |
| Publication status | Published - Apr 2006 |
| Externally published | Yes |
Research Keywords
- Hardness
- Nanocrystalline tantalum
- Nanoindentation
- Sputtering
- Thin films
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