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Hardness enhancement in nanocrystalline tantalum thin films

  • M. Zhang
  • , B. Yang
  • , J. Chu
  • , T.G. Nieh*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Nanocrystalline tantalum thin film was prepared by radio frequency magnetron sputtering on a glass substrate. The structure and mechanical properties of the as-deposited thin film were investigated by X-ray diffraction, transmission electron microscopy, and nanoindentation. The salient feature in the present tantalum thin film with a grain size of 76.5 nm is the remarkable enhancement of hardness, being about one order of magnitude higher than that of bulk coarse-grained tantalum.
Original languageEnglish
Pages (from-to)1227-1230
JournalScripta Materialia
Volume54
Issue number7
Online published19 Jan 2006
DOIs
Publication statusPublished - Apr 2006
Externally publishedYes

Research Keywords

  • Hardness
  • Nanocrystalline tantalum
  • Nanoindentation
  • Sputtering
  • Thin films

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