Growth of dielectric-embedded silicon nanocrystallites for silicon integrated photonics

H. Wong*, C. K. Wong

*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

Silicon integrated photonics has attracted much attentions recently because of the available of silicon-based quantum devices and optical components. Dielectric films with embedded silicon nanocrystallites (Si-NCs) have been recognized as one of the promising light-emitting materials for this purpose. This work reviews some attempts reported recently for preparing dielectric-embedded Si-NCs based on the conventional CMOS processes. The mechanism for the Si-NCs formation is discussed. The material and light emitting properties of the as-prepared Si-NC embedded in dielectric films are studied in detail. © 2010 IEEE.
Original languageEnglish
Title of host publication2010 27th International Conference on Microelectronics, MIEL 2010 - Proceedings
Pages15-19
DOIs
Publication statusPublished - 2010
Event2010 27th International Conference on Microelectronics, MIEL 2010 - Nis, Serbia
Duration: 16 May 201019 May 2010

Conference

Conference2010 27th International Conference on Microelectronics, MIEL 2010
PlaceSerbia
CityNis
Period16/05/1019/05/10

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