Growth of c-axis orientation ZnO films on polymer substrates by radio-frequency magnetron sputtering

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)1244-1250
Journal / PublicationOptical Materials
Volume30
Issue number8
Publication statusPublished - Apr 2008

Abstract

ZnO films with c-axis orientation were deposited successfully on benzocyclobutene (BCB) and highly fluorinated polyether (HFP) substrates by radio-frequency magnetron sputtering. The effects of the sputtering parameters (argon-oxygen gas flow ratio, sputtering power, and sputtering pressure) on the crystalline quality of the ZnO films were investigated by X-ray diffractometry, atomic force microscopy, and scanning electron microscopy. By using optimized sputtering conditions, uniform ZnO films with good c-axis orientation were formed on hard BCB substrates to a thickness as large as 3.0 μm. The ZnO films formed on soft HFP substrates, however, were always thinner than 1 μm. In addition, a ZnO/BCB channel optical waveguide was fabricated, which had a propagation loss of 7.3 dB/cm at the wavelength 1550 nm. © 2007 Elsevier B.V. All rights reserved.

Research Area(s)

  • Optical waveguide, Polymer substrate, Sputtering, Thin films, Zinc oxide