Abstract
ZnO films with c-axis orientation were deposited successfully on benzocyclobutene (BCB) and highly fluorinated polyether (HFP) substrates by radio-frequency magnetron sputtering. The effects of the sputtering parameters (argon-oxygen gas flow ratio, sputtering power, and sputtering pressure) on the crystalline quality of the ZnO films were investigated by X-ray diffractometry, atomic force microscopy, and scanning electron microscopy. By using optimized sputtering conditions, uniform ZnO films with good c-axis orientation were formed on hard BCB substrates to a thickness as large as 3.0 μm. The ZnO films formed on soft HFP substrates, however, were always thinner than 1 μm. In addition, a ZnO/BCB channel optical waveguide was fabricated, which had a propagation loss of 7.3 dB/cm at the wavelength 1550 nm. © 2007 Elsevier B.V. All rights reserved.
| Original language | English |
|---|---|
| Pages (from-to) | 1244-1250 |
| Journal | Optical Materials |
| Volume | 30 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - Apr 2008 |
Research Keywords
- Optical waveguide
- Polymer substrate
- Sputtering
- Thin films
- Zinc oxide
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