Growth by molecular beam epitaxy of amorphous and crystalline GaNAs alloys with band gaps from 3.4 to 0.8 eV for solar energy conversion devices
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 60-63 |
Journal / Publication | Journal of Crystal Growth |
Volume | 323 |
Issue number | 1 |
Publication status | Published - 15 May 2011 |
Externally published | Yes |
Link(s)
Abstract
Using low temperature MBE, we have shown that it is possible to grow amorphous GaN1-xAsx layers with a variable As content (0
Research Area(s)
- Molecular beam epitaxy, Nitrides, Semiconducting IIIV materials
Citation Format(s)
Growth by molecular beam epitaxy of amorphous and crystalline GaNAs alloys with band gaps from 3.4 to 0.8 eV for solar energy conversion devices. / Novikov, S. V.; Staddon, C. R.; Foxon, C. T. et al.
In: Journal of Crystal Growth, Vol. 323, No. 1, 15.05.2011, p. 60-63.
In: Journal of Crystal Growth, Vol. 323, No. 1, 15.05.2011, p. 60-63.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review