Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

Zhongzhen Wu; Xiubo Tian; Yongqiang Wei; Chunzhi Gong; Shiqin Yang; Feng Pan; Paul K. Chu

doi:10.1016/j.surfcoat.2013.10.007

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

Zhongzhen Wu
, Xiubo Tian^*
, Yongqiang Wei
, Chunzhi Gong
, Shiqin Yang
, Feng Pan^*
, Paul K. Chu

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

8 Citations (Scopus)

Abstract

A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. © 2013.

Original language	English
Pages (from-to)	320-325
Journal	Surface and Coatings Technology
Volume	236
DOIs	https://doi.org/10.1016/j.surfcoat.2013.10.007
Publication status	Published - 15 Dec 2013

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SDG 7 Affordable and Clean Energy

Research Keywords

CrN layer
High-power pulsed magnetron sputtering
Interface
Plasma immersion ion implantation and deposition
Stress

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10.1016/j.surfcoat.2013.10.007

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@article{f754c9f0eee04b8c81eb585c66395b76,

title = "Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII\&D)",

abstract = "A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII\&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII\&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. {\textcopyright} 2013.",

keywords = "CrN layer, High-power pulsed magnetron sputtering, Interface, Plasma immersion ion implantation and deposition, Stress",

author = "Zhongzhen Wu and Xiubo Tian and Yongqiang Wei and Chunzhi Gong and Shiqin Yang and Feng Pan and Chu, \{Paul K.\}",

year = "2013",

month = dec,

day = "15",

doi = "10.1016/j.surfcoat.2013.10.007",

language = "English",

volume = "236",

pages = "320--325",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

}

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D). / Wu, Zhongzhen; Tian, Xiubo; Wei, Yongqiang et al.
In: Surface and Coatings Technology, Vol. 236, 15.12.2013, p. 320-325.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

TY - JOUR

T1 - Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

AU - Wu, Zhongzhen

AU - Tian, Xiubo

AU - Wei, Yongqiang

AU - Gong, Chunzhi

AU - Yang, Shiqin

AU - Pan, Feng

AU - Chu, Paul K.

PY - 2013/12/15

Y1 - 2013/12/15

N2 - A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. © 2013.

AB - A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. © 2013.

KW - CrN layer

KW - High-power pulsed magnetron sputtering

KW - Interface

KW - Plasma immersion ion implantation and deposition

KW - Stress

UR - https://www.scopus.com/pages/publications/84888822964

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84888822964&origin=recordpage

U2 - 10.1016/j.surfcoat.2013.10.007

DO - 10.1016/j.surfcoat.2013.10.007

M3 - RGC 21 - Publication in refereed journal

SN - 0257-8972

VL - 236

SP - 320

EP - 325

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

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