Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE

Zhenghua An; Ricky K.Y. Fu; Peng Chen; Weili Liu; Paul K. Chu; C. L. Lin

Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE

Zhenghua An
, Ricky K.Y. Fu
, Peng Chen
, Weili Liu
, Paul K. Chu
, C. L. Lin

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Original language	English
Title of host publication	Integration of heterogeneous thin-film materials and devices
Pages	152
Publication status	Published - Apr 2003
Event	Symposium G - Integration of Heterogeneous Thin-Film Materials and Devices - San Francisco, United States Duration: 23 Apr 2003 → 24 Apr 2003

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	768
ISSN (Print)	0272-9172

Conference

Conference	Symposium G - Integration of Heterogeneous Thin-Film Materials and Devices
Place	United States
City	San Francisco
Period	23/04/03 → 24/04/03

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@inproceedings{7639e1d2c9f34ef995d9240dc4c13048,

title = "Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE",

author = "Zhenghua An and Fu, \{Ricky K.Y.\} and Peng Chen and Weili Liu and Chu, \{Paul K.\} and Lin, \{C. L.\}",

year = "2003",

month = apr,

language = "English",

isbn = "1558997059",

series = "Materials Research Society Symposium Proceedings",

pages = "152",

booktitle = "Integration of heterogeneous thin-film materials and devices",

note = "Symposium G - Integration of Heterogeneous Thin-Film Materials and Devices ; Conference date: 23-04-2003 Through 24-04-2003",

}

An, Z, Fu, RKY, Chen, P, Liu, W, Chu, PK & Lin, CL 2003, Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE. in Integration of heterogeneous thin-film materials and devices . Materials Research Society Symposium Proceedings, vol. 768, pp. 152, Symposium G - Integration of Heterogeneous Thin-Film Materials and Devices , San Francisco, California, United States, 23/04/03.

Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE. / An, Zhenghua; Fu, Ricky K.Y.; Chen, Peng et al.
Integration of heterogeneous thin-film materials and devices . 2003. p. 152 (Materials Research Society Symposium Proceedings; Vol. 768).

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Ge DIFFUSION STUDY IN OXYGEN-IMPLANTED SiGe/Si HETEROSTRUCTURE

AU - An, Zhenghua

AU - Fu, Ricky K.Y.

AU - Chen, Peng

AU - Liu, Weili

AU - Chu, Paul K.

AU - Lin, C. L.

PY - 2003/4

Y1 - 2003/4

M3 - RGC 32 - Refereed conference paper (with host publication)

SN - 1558997059

T3 - Materials Research Society Symposium Proceedings

SP - 152

BT - Integration of heterogeneous thin-film materials and devices

T2 - Symposium G - Integration of Heterogeneous Thin-Film Materials and Devices

Y2 - 23 April 2003 through 24 April 2003

ER -