Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

25 Scopus Citations
View graph of relations

Author(s)

  • Ravi L. Hadimani
  • Joao H.B. Silva
  • Andre M. Pereira
  • Devo L. Schlagel
  • Thomas A. Lograsso
  • Xiaoyi Zhang
  • David C. Jiles
  • Joao P. Araújo

Detail(s)

Original languageEnglish
Article number032402
Journal / PublicationApplied Physics Letters
Volume106
Issue number3
Publication statusPublished - 19 Jan 2015
Externally publishedYes

Abstract

Magnetic refrigeration based on the magnetocaloric effect is one of the best alternatives to compete with vapor-compression technology. Despite being already in its technology transfer stage, there is still room for optimization, namely, on the magnetic responses of the magnetocaloric material. In parallel, the demand for different magnetostrictive materials has been greatly enhanced due to the wide and innovative range of technologies that emerged in the last years (from structural evaluation to straintronics fields). In particular, the Gd5(SixGe1-x)4 compounds are a family of well-known alloys that present both giant magnetocaloric and colossal magnetostriction effects. Despite their remarkable properties, very few reports have been dedicated to the nanostructuring of these materials: here, we report a ∼800 nm Gd5Si2.7Ge1.3 thin film. The magnetic and structural investigation revealed that the film undergoes a first order magnetostructural transition and as a consequence exhibits large magnetocaloric effect (-ΔSmMAX ∼ 8.83 J kg-1 K-1, ΔH = 5T) and giant thermal expansion (12000 p.p.m). The thin film presents a broader magnetic response in comparison with the bulk compound, which results in a beneficial magnetic hysteresis reduction. The ΔSmMAX exhibited by the Gd5(Si,Ge)4 thin film makes it a promising candidate for micro/nano magnetic refrigeration area.

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition. / Hadimani, Ravi L.; Silva, Joao H.B.; Pereira, Andre M.; Schlagel, Devo L.; Lograsso, Thomas A.; Ren, Yang; Zhang, Xiaoyi; Jiles, David C.; Araújo, Joao P.

In: Applied Physics Letters, Vol. 106, No. 3, 032402, 19.01.2015.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review