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From Concept to Practice: an Automated LLM-aided UVM Machine for RTL Verification

  • Junhao Ye
  • , Yuchen Hu
  • , Ke Xu
  • , Dingrong Pan
  • , Qichun Chen
  • , Jie Zhou
  • , Shuai Zhao
  • , Xinwei Fang*
  • , Xi Wang*
  • , Nan Guan
  • , Zhe Jiang*
  • *Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

Verification presents a major bottleneck in Integrated Circuit (IC) development, consuming nearly 70% of the total development effort. While the Universal Verification Methodology (UVM) is widely used in industry to improve verification efficiency through structured and reusable testbenches, constructing these testbenches and generating sufficient stimuli remain challenging. These challenges arise from the considerable manual coding effort required, repetitive manual execution of multiple EDA tools, and the need for in-depth domain expertise to navigate complex designs. Here, we present UVM2, an automated verification framework that leverages Large Language Models (LLMs) to generate UVM testbenches and iteratively refine them using coverage feedback, significantly reducing manual effort while maintaining rigorous verification standards. To evaluate UVM2, we introduce a benchmark suite comprising Register Transfer Level (RTL) designs of up to 1.6K lines of code. The results show that UVM2 reduces testbench setup time by up to 38.82× compared to experienced engineers, and achieve average code and function coverage of 87.44% and 89.58%, outperforming state- of-the-art solutions by 20.96% and 23.51%, respectively. © 2025 IEEE.
Original languageEnglish
Title of host publication2025 IEEE/ACM International Conference On Computer Aided Design (ICCAD)
PublisherIEEE
Number of pages9
ISBN (Electronic)979-8-3315-1560-7
ISBN (Print)979-8-3315-1561-4
DOIs
Publication statusPublished - 2025
Event44th IEEE/ACM International Conference on Computer-Aided Design (ICCAD 2025) - Munich, Germany
Duration: 26 Oct 202530 Oct 2025

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1933-7760
ISSN (Electronic)1558-2434

Conference

Conference44th IEEE/ACM International Conference on Computer-Aided Design (ICCAD 2025)
PlaceGermany
CityMunich
Period26/10/2530/10/25

Funding

This work is supported by the National Key Research and Development Program (Grant No. 2024YFB4405600), the National Natural Science Foundation of China (Grant No. 62472086 and No. 92464301), the Basic Research Program of Jiangsu (Grant No. BK20243042), the Science and Technology Major Special Program of Jiangsu (Grants No. BG2024010), and the Start-up Research Fund of Southeast University (Grant No. RG1028624005).

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