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Formation of silicon-on-diamond by direct bonding of plasma-synthesized diamond-like carbon to silicon

  • Ming Zhu
  • , Paul K. Chu
  • , Xuejie Shi
  • , Man Wong
  • , Weili Liu
  • , Chenglu Lin

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    The formation of a silicon-on-diamond structure by direct bonding of plasma synthesized diamond-like-carbon (DLC) thin film was discussed. A plasma immersion ion implantation and deposition process was carried out to synthesize the DLC films on silicon. Outstanding surface topography was observed for the films which maintained excellent insulating characteristics up to an annealing temperature of 900 °C. It was observed that the bonded interface was sharp and the top Si layer exhibited almost perfect crystal quality.
    Original languageEnglish
    Pages (from-to)2532-2534
    JournalApplied Physics Letters
    Volume85
    Issue number13
    DOIs
    Publication statusPublished - 27 Sept 2004

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