Abstract
The formation of a silicon-on-diamond structure by direct bonding of plasma synthesized diamond-like-carbon (DLC) thin film was discussed. A plasma immersion ion implantation and deposition process was carried out to synthesize the DLC films on silicon. Outstanding surface topography was observed for the films which maintained excellent insulating characteristics up to an annealing temperature of 900 °C. It was observed that the bonded interface was sharp and the top Si layer exhibited almost perfect crystal quality.
| Original language | English |
|---|---|
| Pages (from-to) | 2532-2534 |
| Journal | Applied Physics Letters |
| Volume | 85 |
| Issue number | 13 |
| DOIs | |
| Publication status | Published - 27 Sept 2004 |
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