Formation of epitaxial silicide in silicon nanowires

Yi-Chia Chou; Kuo-Chang Lu; King-Ning Tu

Formation of epitaxial silicide in silicon nanowires

Yi-Chia Chou
, Kuo-Chang Lu
, King-Ning Tu^*

^*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 12 - Chapter in an edited book (Author) › peer-review

1 Citation (Scopus)

Original language	English
Title of host publication	Silicon and Silicide Nanowires
Subtitle of host publication	Applications, Fabrication and Properties
Editors	Yu Huang, King-Ning Tu
Place of Publication	Singapore
Publisher	Pan Stanford Publishing Pte. Ltd.
Pages	187-243
ISBN (Electronic)	9789814303477
ISBN (Print)	9789814303460
Publication status	Published - 2014
Externally published	Yes

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@inbook{468f0cf680a840869ed94822b5916809,

title = "Formation of epitaxial silicide in silicon nanowires",

author = "Yi-Chia Chou and Kuo-Chang Lu and King-Ning Tu",

year = "2014",

language = "English",

isbn = "9789814303460",

pages = "187--243",

editor = "Yu Huang and King-Ning Tu",

booktitle = "Silicon and Silicide Nanowires",

publisher = "Pan Stanford Publishing Pte. Ltd.",

}

Formation of epitaxial silicide in silicon nanowires. / Chou, Yi-Chia; Lu, Kuo-Chang; Tu, King-Ning.
Silicon and Silicide Nanowires: Applications, Fabrication and Properties. ed. / Yu Huang; King-Ning Tu. Singapore: Pan Stanford Publishing Pte. Ltd., 2014. p. 187-243.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 12 - Chapter in an edited book (Author) › peer-review

TY - CHAP

T1 - Formation of epitaxial silicide in silicon nanowires

AU - Chou, Yi-Chia

AU - Lu, Kuo-Chang

AU - Tu, King-Ning

PY - 2014

Y1 - 2014

UR - https://www.scopus.com/pages/publications/84979885315

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84979885315&origin=recordpage

M3 - RGC 12 - Chapter in an edited book (Author)

SN - 9789814303460

SP - 187

EP - 243

BT - Silicon and Silicide Nanowires

A2 - Huang, Yu

A2 - Tu, King-Ning

PB - Pan Stanford Publishing Pte. Ltd.

CY - Singapore

ER -

Formation of epitaxial silicide in silicon nanowires

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