Formation of crystalline diamond by ion beam deposition

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

4 Scopus Citations
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Author(s)

  • X. S. Sun
  • N. Wang
  • I. Bello
  • S. T. Lee

Detail(s)

Original languageEnglish
Pages (from-to)174-179
Journal / PublicationJournal of Non-Crystalline Solids
Volume254
Issue number1-3
Publication statusPublished - Sept 1999

Conference

TitleProceedings of the 1998 2nd International Conference on Amorphous and Crystalline Insulating Thin Films II
CityHong Kong, China
Period12 - 14 October 1998

Abstract

Direct ion beam deposition was used to study the effect of ion bombardment on the formation of carbon films. Amorphous carbon films were deposited on mirror-polished (0 0 1) silicon substrates by means of a low-energy ion beam of Ar/H2/CH4. High-resolution transmission electron microscopy, field emission scanning electron microscopy and micro-Raman microscopy were used to determine some of the properties of the samples. We found that the amorphous carbon film condensed to form clusters and the surface roughness of the film increased with increasing the ion dose. At ion doses approximately 1019/cm2, crystalline diamond particles with sizes of 15-30 nm were formed in the matrix of amorphous carbon films. The formation of crystalline diamond particles may be due to the ion bombardment induced stress and energy fluctuation.

Citation Format(s)

Formation of crystalline diamond by ion beam deposition. / Sun, X. S.; Zhang, W. J.; Wang, N. et al.
In: Journal of Non-Crystalline Solids, Vol. 254, No. 1-3, 09.1999, p. 174-179.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review