Fluorinated aminoalkoxide and ketoiminate indium complexes as MOCVD precursors for In₂O₃ thin film deposition

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Overview

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Material Science

Thin Film Depositio... Material Science

Indium Material Science

Thin Films Material Science

Film Material Science

X-Ray Photoelectron... Material Science

Oxide Compound Material Science

Surface Morphology Material Science

Nuclear Magnetic Re... Material Science

X-Ray Diffraction Material Science

Single Crystal X-Ra... Material Science

Chemistry

Metallorganic Chemi... Chemistry

Indium Chemistry

X-Ray Diffraction Chemistry

Single Crystal X-Ra... Chemistry

Monomer Chemistry

Rutherford Backscat... Chemistry

Amino Alcohol Chemistry

VT NMR Chemistry

Ketoimine Chemistry

formation Chemistry

X Ray Photoemission... Chemistry

dimer Chemistry

Research OutputsResearch Output authored by Fluorinated aminoalkoxide and ketoiminate indium complexes as MOCVD precursors for In2O3 thin film deposition is tagged with the concept

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