Fluorinated aminoalkoxide and ketoiminate indium complexes as MOCVD precursors for In₂O₃ thin film deposition

Chemistry

• Metallorganic Chemical Vapor Deposition 100%
• Indium 100%
• X-Ray Diffraction 33%
• Single Crystal X-Ray Diffraction 33%
• Monomer 33%
• Rutherford Backscattering Spectroscopy 33%
• Amino Alcohol 33%
• VT NMR 33%
• Ketoimine 33%
• formation 33%
• X Ray Photoemission Spectroscopy 33%
• dimer 33%

Material Science

• Thin Film Deposition 100%
• Indium 100%
• Thin Films 66%
• Film 33%
• X-Ray Photoelectron Spectroscopy 33%
• Oxide Compound 33%
• Surface Morphology 33%
• Nuclear Magnetic Resonance 33%
• X-Ray Diffraction 33%
• Single Crystal X-Ray Diffraction 33%