Flexible system for multiple plasma immersion ion implantation-deposition processes

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

11 Scopus Citations
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Author(s)

  • Xiubo Tian
  • Ricky K.Y. Fu
  • Andre Anders
  • Chunzhi Gong
  • Shiqin Yang

Detail(s)

Original languageEnglish
Pages (from-to)5137-5140
Journal / PublicationReview of Scientific Instruments
Volume74
Issue number12
Publication statusPublished - Dec 2003

Abstract

The characteristics of the hardware and typical processes involved in multiple plasma immersion ion implantation-deposition, were presented. In this investigation the function of electrical phase shift was enhanced, and implantation could be performed either before or after the cathodic arc duration. The plasma immersion implanter was modified to perform flexible plasma based ion beam assisted deposition. Results indicated that by carefully selecting the experimental parameters like plasma density, pulse width, synchronization of the cathodic arc and sample bias pulses, pure deposition, pure implantation, and ion beam assisted deposition could be accomplished.

Citation Format(s)

Flexible system for multiple plasma immersion ion implantation-deposition processes. / Tian, Xiubo; Fu, Ricky K.Y.; Chu, Paul K.; Anders, Andre; Gong, Chunzhi; Yang, Shiqin.

In: Review of Scientific Instruments, Vol. 74, No. 12, 12.2003, p. 5137-5140.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review