Abstract
We report the fabrication and characterization of ZnO nanowire memory devices using a ferroelectric Pb(Zr 0.3Ti 0.7)O 3 (PZT) film as the gate dielectric and the charge storage medium. With a comparison to nanowire transistors based on SiO 2 gate oxide, the devices were evaluated in terms of their electric transport, retention, and endurance performance. Memory effects are observed as characterized by an eminent counterclockwise loop in I-V g curves, which is attributed to the switchable remnant polarization of PZT. The single-nanowire device exhibits a high (up to 10 3) on/off ratio at zero gate voltage. Our results give a proof-ofprinciple demonstration of the memory application based on a combination of nanowires (as channels) and ferroelectric films (as gate oxide). © 2009 American Chemical Society.
| Original language | English |
|---|---|
| Pages (from-to) | 700-706 |
| Journal | ACS Nano |
| Volume | 3 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 24 Mar 2009 |
| Externally published | Yes |
Bibliographical note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].Research Keywords
- Depletion
- Ferroelectric
- Field effect transistor
- Nanowires
- Nonvolatile memory
- PZT
- ZnO
Fingerprint
Dive into the research topics of 'Ferroelectric transistors with nanowire channel: Toward nonvolatile memory applications'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver