Feature development on prepatterned elastomer surfaces upon ion implantation

Y. Sun; H. Y. Wang; T. Xiong; P. K. Chu; C. W. Leung

doi:10.1016/j.mee.2013.02.054

Feature development on prepatterned elastomer surfaces upon ion implantation

Y. Sun, H. Y. Wang, T. Xiong, P. K. Chu, C. W. Leung

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Abstract

Oxygen plasma ion implantation on the common elastomer polydimethylsiloxane (PDMS) can induce wrinkled and disordered surface morphologies. Here we present a convenient approach of generating (sub)micron-sized features, in order to control the development of such ripple-like features during plasma treatment process. The correlations between the spontaneous patterns with different surface treatment conditions, such as plasma bias voltage and processing time, as well as the effect of surface prepatterns, were studied. The presence of prepatterns suppressed the formation of ripples on the implanted PDMS surfaces, which is advantageous for eliminating the rough surface topologies induced in plasma-treated samples. © 2013 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	346-349
Journal	Microelectronic Engineering
Volume	110
DOIs	https://doi.org/10.1016/j.mee.2013.02.054
Publication status	Published - 2013

Research Keywords

Ion implantation
PDMS
Prepatterning

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10.1016/j.mee.2013.02.054

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@article{2979f05512454b76b971d7b20b048b7f,

title = "Feature development on prepatterned elastomer surfaces upon ion implantation",

abstract = "Oxygen plasma ion implantation on the common elastomer polydimethylsiloxane (PDMS) can induce wrinkled and disordered surface morphologies. Here we present a convenient approach of generating (sub)micron-sized features, in order to control the development of such ripple-like features during plasma treatment process. The correlations between the spontaneous patterns with different surface treatment conditions, such as plasma bias voltage and processing time, as well as the effect of surface prepatterns, were studied. The presence of prepatterns suppressed the formation of ripples on the implanted PDMS surfaces, which is advantageous for eliminating the rough surface topologies induced in plasma-treated samples. {\textcopyright} 2013 Elsevier B.V. All rights reserved.",

keywords = "Ion implantation, PDMS, Prepatterning",

author = "Y. Sun and Wang, {H. Y.} and T. Xiong and Chu, {P. K.} and Leung, {C. W.}",

year = "2013",

doi = "10.1016/j.mee.2013.02.054",

language = "English",

volume = "110",

pages = "346--349",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Feature development on prepatterned elastomer surfaces upon ion implantation

AU - Sun, Y.

AU - Wang, H. Y.

AU - Xiong, T.

AU - Chu, P. K.

AU - Leung, C. W.

PY - 2013

Y1 - 2013

N2 - Oxygen plasma ion implantation on the common elastomer polydimethylsiloxane (PDMS) can induce wrinkled and disordered surface morphologies. Here we present a convenient approach of generating (sub)micron-sized features, in order to control the development of such ripple-like features during plasma treatment process. The correlations between the spontaneous patterns with different surface treatment conditions, such as plasma bias voltage and processing time, as well as the effect of surface prepatterns, were studied. The presence of prepatterns suppressed the formation of ripples on the implanted PDMS surfaces, which is advantageous for eliminating the rough surface topologies induced in plasma-treated samples. © 2013 Elsevier B.V. All rights reserved.

AB - Oxygen plasma ion implantation on the common elastomer polydimethylsiloxane (PDMS) can induce wrinkled and disordered surface morphologies. Here we present a convenient approach of generating (sub)micron-sized features, in order to control the development of such ripple-like features during plasma treatment process. The correlations between the spontaneous patterns with different surface treatment conditions, such as plasma bias voltage and processing time, as well as the effect of surface prepatterns, were studied. The presence of prepatterns suppressed the formation of ripples on the implanted PDMS surfaces, which is advantageous for eliminating the rough surface topologies induced in plasma-treated samples. © 2013 Elsevier B.V. All rights reserved.

KW - Ion implantation

KW - PDMS

KW - Prepatterning

UR - http://www.scopus.com/inward/record.url?scp=84885171630&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84885171630&origin=recordpage

U2 - 10.1016/j.mee.2013.02.054

DO - 10.1016/j.mee.2013.02.054

M3 - RGC 21 - Publication in refereed journal

SN - 0167-9317

VL - 110

SP - 346

EP - 349

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Feature development on prepatterned elastomer surfaces upon ion implantation

Abstract

Research Keywords

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