Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)43-45
Journal / PublicationNano Letters
Volume3
Issue number1
Online published14 Dec 2002
Publication statusPublished - 1 Jan 2003
Externally publishedYes

Abstract

The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12-100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold. © 2003 American Chemical Society

Citation Format(s)

Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography. / Zhang, Hua; Chung, Sung-Wook; Mirkin, Chad A.

In: Nano Letters, Vol. 3, No. 1, 01.01.2003, p. 43-45.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review