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Fabrication of Single- and multilayer MoS2 Film-Based Field-Effect Transistors for Sensing NO at Room Temperature

  • Hai Li
  • , Zongyou Yin
  • , Qiyuan He
  • , Hong Li
  • , Xiao Huang
  • , Gang Lu
  • , Derrick Wen Hui Fam
  • , Alfred Iing Yoong Tok
  • , Qing Zhang
  • , Hua Zhang*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Single‐ and multilayer MoS2 films are deposited onto Si/SiO2 using the mechanical exfoliation technique. The films were then used for the fabrication of field‐effect transistors (FETs). These FET devices can be used as gas sensors to detect nitrous oxide (NO). Although the single‐layer MoS2 device shows a rapid response after exposure to NO, the current was found to be unstable. The two‐, three‐, and four‐layer MoS2 devices show both stable and sensitive responses to NO down to a concentration of 0.8 ppm. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Original languageEnglish
Pages (from-to)63-67
JournalSmall
Volume8
Issue number1
Online published20 Oct 2011
DOIs
Publication statusPublished - 9 Jan 2012
Externally publishedYes

Research Keywords

  • 2D nanomaterials
  • field-effect transistors
  • gas sensors
  • mechanical exfoliation
  • MoS2

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