@inproceedings{c928196abd874af59268cb7dc6756b63,
title = "Fabrication of silica-on-silicon waveguide devices by PECVD",
abstract = "Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).",
keywords = "ICP, PECVD, Planar lightwave circuits (PLC), Silica, Waveguide, Waveguide loss",
author = "Lin, \{S. F.\} and Hou, \{J. P.\} and Chiu, \{C. H.\} and Lin, \{J. Y.\} and Chu, \{T. C.\} and Tsai, \{D. P.\} and A.K. Chu",
year = "2002",
doi = "10.1117/12.481243",
language = "English",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "338--344",
editor = "Shuisheng Jian and Steven Shen and Katsunari Okamoto",
booktitle = "Optical Fiber and Planar Waveguide Technology II",
address = "United States",
note = "Asia-Pacific Optical and Wireless Communications (APOC 2002) ; Conference date: 16-10-2002 Through 18-10-2002",
}