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Fabrication and Characterization of Silicon Microchannel Plates as Temperature-Sensing Materials

  • Pengliang CI
  • , Jing SHI
  • , Fei WANG
  • , Shaohui XU
  • , Zhenya YANG
  • , Pingxiong YANG
  • , Lianwei WANG*
  • , Paul K. CHU
  • *Corresponding author for this work

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    Silicon microchannel plates (Si MCPs) are prepared by photo-assisted electrochemical etching (PAECE), and their temperature-sensing behavior based on the Seebeck effect is studied. In particular, the dependence of the temperature sensitivity on the orientation and pore size of the Si MCPs is determined in detail. Our results clarify the relationship between the temperature sensitivity and orientation of the Si MCPs. When the angle between the measured orientation and edge of the square micropore is 45°, the samples with pore dimensions of 5 μm × 5 μm and 3 μm × 3 μm show temperature sensitivities of 1.88 mV/°C and 0.93 mV/°C, respectively. In general, the sample with pore size of 5 μm × 5 μm exhibits higher sensitivity. Si MCPs which are compatible with integrated circuit (IC) processing have promising applications in integrated microtemperature sensing. © 2011 TMS.
    Original languageEnglish
    Pages (from-to)2363-2367
    JournalJournal of Electronic Materials
    Volume40
    Issue number12
    Online published13 Oct 2011
    DOIs
    Publication statusPublished - Dec 2011

    Research Keywords

    • electrochemical etching
    • Seebeck effect
    • Silicon microchannel plate
    • temperature sensor

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