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Fabrication and characterization of porous polycrystalline silicon resistive sensor

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

A thin layer of p-type anodized porous polycrystalline silicon (PPS) are formed on n-type epitaxial crystal silicon wafer. The sensitivity of the resistors based on this PPS has been characterized and analyzed at different ambient pressures and temperature as well as gas species. Results show that the current-voltage characteristics are highly sensitive to the ambient pressure and organic gases. In addition, the effects of illumination and temperature are also studied.
Original languageEnglish
Title of host publicationProceedings 1998 IEEE Hong Kong Electron Devices Meeting
PublisherIEEE
Pages152-156
ISBN (Print)0-7803-4932-6
DOIs
Publication statusPublished - Aug 1998
Event5th IEEE Hong Kong Electron Devices Meeting, HKEDM 1998 - Hong Kong, Hong Kong, China
Duration: 29 Aug 199829 Aug 1998

Publication series

NameProceedings - IEEE Hong Kong Electron Devices Meeting, HKEDM
Volume1998-August

Conference

Conference5th IEEE Hong Kong Electron Devices Meeting, HKEDM 1998
PlaceHong Kong, China
CityHong Kong
Period29/08/9829/08/98

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