Fabrication and characteristics of novel microelectronic structures fabricated by plasma-based techniques

Engineering

• Dielectrics 100%
• Microelectronics 100%
• Silicon on Insulator 100%
• Ion Implantation 50%
• Thin Films 50%
• Engineering 50%
• Diamond-Like Carbon 50%
• Heating Effect 50%
• Hydrogen Energy 50%
• Hydrogenation 50%
• Silicon Dioxide 50%
• Hydrogen 50%
• Aluminum Nitride 50%