EZ-sketching : Three-level optimization for error-tolerant image tracing

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Detail(s)

Original languageEnglish
Article number54
Journal / PublicationACM Transactions on Graphics
Volume33
Issue number4
StatePublished - Jul 2014

Conference

Title41st International Conference and Exhibition on Computer Graphics and Interactive Techniques, ACM SIGGRAPH 2014
PlaceCanada
CityVancouver, BC
Period10 - 14 August 2014

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Abstract

We present a new image-guided drawing interface called EZ-Sketching, which uses a tracing paradigm and automatically corrects sketch lines roughly traced over an image by analyzing and utilizing the image features being traced. While previous edge snapping methods aim at optimizing individual strokes, we show that a co-analysis of multiple roughly placed nearby strokes better captures the user's intent. We formulate automatic sketch improvement as a three-level optimization problem and present an efficient solution to it. EZ-Sketching can tolerate errors from various sources such as indirect control and inherently inaccurate input, and works well for sketching on touch devices with small screens using fingers. Our user study confirms that the drawings our approach helped generate show closer resemblance to the traced images, and are often aesthetically more pleasing. Copyright © ACM.

Research Area(s)

  • Co-analysis, Edge snapping, Interactive drawing, Stroke improvement

Bibliographic Note

Full text of this publication does not contain sufficient affiliation information. With consent from the author(s) concerned, the Research Unit(s) information for this record is based on the existing academic department affiliation of the author(s).

Citation Format(s)

EZ-sketching : Three-level optimization for error-tolerant image tracing. / Su, Qingkun; Andy Li, Wing Ho; Wang, Jue; Fu, Hongbo.

In: ACM Transactions on Graphics, Vol. 33, No. 4, 54, 07.2014.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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