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Exploring pore formation of atomic layer-deposited overlayers by in situ small- and wide-angle X-ray scattering

  • Tao Li
  • , Saurabh Karwal
  • , Bachir Aoun
  • , Haiyan Zhao
  • , Yang Ren
  • , Christian P. Canlas
  • , Jeffrey W. Elam
  • , Randall E. Winans*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

In this work, we explore the pore structure of overcoated materials by in situ synchrotron small-angle (SAXS) and wide-angle X-ray scattering (WAXS). Thin films of aluminum oxide (Al2O3) and titanium dioxide (TiO2) with thicknesses of 4.9 and 2.5 nm, respectively, are prepared by atomic layer deposition (ALD) on nonporous nanoparticles. In situ X-ray measurements reveal that porosity is induced in the ALD films by annealing the samples at high temperatures. Moreover, this pore formation can be attributed to densification resulting from an amorphous to crystalline phase transition of the ALD films as confirmed by high-resolution X-ray diffraction and the pair distribution function. Simultaneous SAXS and WAXS results show not only that the porosity is formed by the phase transition but also that the pore size increases with temperature.
Original languageEnglish
Pages (from-to)7082-7087
JournalChemistry of Materials
Volume28
Issue number19
DOIs
Publication statusPublished - 11 Oct 2016
Externally publishedYes

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