Experimental investigation of discharge characteristics in enhanced glow discharge plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)6183-6186
Journal / PublicationPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume372
Issue number40
Publication statusPublished - 29 Sep 2008

Abstract

In enhanced glow discharge plasma immersion ion implantation (EGD-PIII) that involves a small pointed anode and large area tabular cathode, the high negative substrate bias not only acts as the plasma producer but also supplies the implantation voltage. Consequently, an electric field is created to focus the electrons and the electron focusing field in turn enhances the glow discharge process. In this work, the discharge characteristics of EGD-PIII are investigated experimentally. The discharge initiation and extinction characteristics during pulsed biasing are discussed. The duration of the post pulse-off plasma is explained from the viewpoint of particle motion and experimentally verified by employing an auxiliary disk. Our experiments show that a dual-pulse method may be utilized to determine the remnant plasma. © 2008 Elsevier B.V. All rights reserved.

Research Area(s)

  • Glow discharge, Plasma immersion ion implantation, Pulse biasing

Citation Format(s)

Experimental investigation of discharge characteristics in enhanced glow discharge plasma immersion ion implantation. / Lu, Qiu Yuan; Li, Liu He; Fu, Ricky K.Y. et al.

In: Physics Letters, Section A: General, Atomic and Solid State Physics, Vol. 372, No. 40, 29.09.2008, p. 6183-6186.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review