Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum

Ming Xu; Youming Liu; Liuhe Li; Xun Cai; Qiulong Chen; Paul K. Chu

doi:10.1116/1.2165657

Author(s)

Ming Xu
Youming Liu
Liuhe Li
Xun Cai
Qiulong Chen

Detail(s)

Original language	English
Pages (from-to)	212-217
Journal / Publication	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	24
Issue number	2
Publication status	Published - Mar 2006

Link(s)

DOI	DOI https://doi.org/10.1116/1.2165657 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-33644597279&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(50f68094-7172-487b-8f99-2e2dbe6ab79f).html

Abstract

Titanium ions were implanted into aluminum substrates at 40 kV prior to magnetron sputtering deposition of the Ti interlayer and TiN film using our custom-designed multifunctional ion implanter without breaking vacuum. An 82-nm -thick modified layer was formed between the TiN film and the substrate. The characteristics of the implanted samples were compared to those of TiNAl and TiNTiAl samples that were not preimplanted. Based on our scratch tests, the critical loading Lc of the TiNTiTi -implanted Al sample was significantly improved compared to the unimplanted TiNAl and TiNTiAl samples. Finite element analysis was conducted to simulate the scratch process to help reveal the stress distributions in the vicinity of the interlayer. The results show that the stress around the interface is largely reduced in the TiNTiTi -implanted Al sample. Consequently, the mechanical properties such as resistance to loadings are enhanced. © 2006 American Vacuum Society.

Citation Format(s)

[ RIS ] [ BibTeX ]

Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum. / Xu, Ming; Liu, Youming; Li, Liuhe et al.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 24, No. 2, 03.2006, p. 212-217.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Xu, M, Liu, Y, Li, L, Cai, X, Chen, Q & Chu, PK 2006, 'Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 24, no. 2, pp. 212-217. https://doi.org/10.1116/1.2165657

Xu, M., Liu, Y., Li, L., Cai, X., Chen, Q., & Chu, P. K. (2006). Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 24(2), 212-217. https://doi.org/10.1116/1.2165657

Xu M, Liu Y, Li L, Cai X, Chen Q, Chu PK. Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2006 Mar;24(2):212-217. doi: 10.1116/1.2165657

Xu, Ming ; Liu, Youming ; Li, Liuhe et al. / Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2006 ; Vol. 24, No. 2. pp. 212-217.