Evolution of structural order in germanium ion-implanted amorphous silicon layers

S. L. Cheng, H. H. Lin, J. H. He, T. F. Chiang, C. H. Yu, L. J. Chen, C. K. Yang, D. Y. Wu, S. C. Chien, W. C. Chen

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

18 Citations (Scopus)

Abstract

High-resolution transmission electron microscopy in conjunction with autocorrelation function analysis have been applied to investigate the evolution of structural order in germanium ion-implanted amorphous silicon (a-Si) layers. A high density of Si nanocrystallites as small as 1 nm in size was detected in as-implanted a-Si layers. The density of embedded nanocrystalline Si was found to diminish in a-Si layers with annealing temperature first then increase. The results are discussed in the context of free energy change with annealing temperature. © 2002 American Institute of Physics.
Original languageEnglish
Pages (from-to)910-913
JournalJournal of Applied Physics
Volume92
Issue number2
Online published28 Jun 2002
DOIs
Publication statusPublished - 15 Jul 2002
Externally publishedYes

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