Abstract
High-resolution transmission electron microscopy in conjunction with autocorrelation function analysis have been applied to investigate the evolution of structural order in germanium ion-implanted amorphous silicon (a-Si) layers. A high density of Si nanocrystallites as small as 1 nm in size was detected in as-implanted a-Si layers. The density of embedded nanocrystalline Si was found to diminish in a-Si layers with annealing temperature first then increase. The results are discussed in the context of free energy change with annealing temperature. © 2002 American Institute of Physics.
| Original language | English |
|---|---|
| Pages (from-to) | 910-913 |
| Journal | Journal of Applied Physics |
| Volume | 92 |
| Issue number | 2 |
| Online published | 28 Jun 2002 |
| DOIs | |
| Publication status | Published - 15 Jul 2002 |
| Externally published | Yes |