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Evidence that N2O is a stronger oxidizing agent than O2 for the post-deposition annealing of Ta2O5 on Si capacitors

  • Wai Shing Lau
  • , Peng Wei Qian
  • , Nathan P. Sandler
  • , Kevin A. McKinley
  • , Paul K. Chu

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    50   Link opens in a new tab Citations (Scopus)

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