Erratum : Kinetics of the formation of hafnium silicides on silicon (Journal of Applied Physics (1973) 44 (3851))

Research output: Journal Publications and Reviews › Erratum

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Author(s)

  • J. F. Ziegler
  • J. W. Mayer
  • C. J. Kircher
  • K. N. Tu

Detail(s)

Original languageEnglish
Journal / PublicationJournal of Applied Physics
Volume45
Issue number10
Publication statusPublished - 1974
Externally publishedYes

Link(s)

DOI

DOI
Check@CityULib
Link to Scopus https://www.scopus.com/record/display.uri?eid=2-s2.0-36749108540&origin=recordpage
Permanent Link https://scholars.cityu.edu.hk/en/publications/publication(5150c89b-03f2-4f50-94f2-dfbf46a7fae6).html

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Citation Format(s)

[ RIS ] [ BibTeX ]
Erratum: Kinetics of the formation of hafnium silicides on silicon (Journal of Applied Physics (1973) 44 (3851)). / Ziegler, J. F.; Mayer, J. W.; Kircher, C. J. et al.
In: Journal of Applied Physics, Vol. 45, No. 10, 1974.

Research output: Journal Publications and Reviews › Erratum