Epitaxial growth of CdSexTe1-x thin films on Si(1 0 0) by molecular beam epitaxy using lattice mismatch graded structures
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 1081-1087 |
Journal / Publication | Journal of Crystal Growth |
Volume | 310 |
Issue number | 6 |
Publication status | Published - 15 Mar 2008 |
Externally published | Yes |
Link(s)
Abstract
CdSeTe epilayers were grown by molecular beam epitaxy on (1 0 0)-oriented vicinal silicon wafers. By controlling the growth conditions, either multiple-phase or single-phase epilayers could be deposited. In this paper we present a detailed investigation of the structure of a single-phase CdSeTe epilayer using X-ray diffraction, Rutherford back scattering, and transmission electron microscopy. Photoreflectance and photocurrent results are also presented. © 2007 Elsevier B.V. All rights reserved.
Research Area(s)
- A3. Molecular beam epitaxy, B1. Cadmium compounds, B2. Semiconducting II-VI materials
Citation Format(s)
Epitaxial growth of CdSexTe1-x thin films on Si(1 0 0) by molecular beam epitaxy using lattice mismatch graded structures. / Amir, F. Z.; Clark, K.; Maldonado, E. et al.
In: Journal of Crystal Growth, Vol. 310, No. 6, 15.03.2008, p. 1081-1087.
In: Journal of Crystal Growth, Vol. 310, No. 6, 15.03.2008, p. 1081-1087.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review