Enhancing the hardness of arc-ion-plated nanocrystallite TiN films

X. Yu; M. Hua; C. B. Wang; Y. Liu; D. Y. Yu; S. L. Ma

doi:10.1088/0957-4484/18/35/355710

Author(s)

X. Yu
C. B. Wang
Y. Liu
D. Y. Yu
S. L. Ma

Detail(s)

Original language	English
Article number	355710
Journal / Publication	Nanotechnology
Volume	18
Issue number	35
Publication status	Published - 5 Sep 2007

Link(s)

DOI	DOI https://doi.org/10.1088/0957-4484/18/35/355710 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-34548661310&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(e35413fb-ecbf-46f8-8a0f-8f74c0d8529f).html

Abstract

Enhancing the hardness of nanocrystallite TiN films synthesized on M2 steel substrate in a vacuum cathode multi-arc ion-plating system was investigated. The synthesized film gives: (i) mean grain sizes of about 12.7 nm for TiN ₁₁₁, 19.7 nm for TiN₂₀₀ and 9.6 nm for TiN₂₂₀; and (ii) achievable microhardness up to 45 GPa that is more than twice the 22 GPa for standard TiN film. Such hardness enhancement is anticipated as being mainly due to: (i) the formation of nanoscale crystalline grains; (ii) the preferential orientation and growth of grains in the close-packed plane (111); and (iii) induced residual stress within the film by ion bombardment. © IOP Publishing Ltd.

Citation Format(s)

[ RIS ] [ BibTeX ]

Enhancing the hardness of arc-ion-plated nanocrystallite TiN films. / Yu, X.; Hua, M.; Wang, C. B.; Liu, Y.; Yu, D. Y.; Ma, S. L.

In: Nanotechnology, Vol. 18, No. 35, 355710, 05.09.2007.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Yu, X, Hua, M, Wang, CB, Liu, Y, Yu, DY & Ma, SL 2007, 'Enhancing the hardness of arc-ion-plated nanocrystallite TiN films', Nanotechnology, vol. 18, no. 35, 355710. https://doi.org/10.1088/0957-4484/18/35/355710

Yu, X., Hua, M., Wang, C. B., Liu, Y., Yu, D. Y., & Ma, S. L. (2007). Enhancing the hardness of arc-ion-plated nanocrystallite TiN films. Nanotechnology, 18(35), [355710]. https://doi.org/10.1088/0957-4484/18/35/355710

Yu X, Hua M, Wang CB, Liu Y, Yu DY, Ma SL. Enhancing the hardness of arc-ion-plated nanocrystallite TiN films. Nanotechnology. 2007 Sep 5;18(35). 355710. https://doi.org/10.1088/0957-4484/18/35/355710

Yu, X. ; Hua, M. ; Wang, C. B. ; Liu, Y. ; Yu, D. Y. ; Ma, S. L. / Enhancing the hardness of arc-ion-plated nanocrystallite TiN films. In: Nanotechnology. 2007 ; Vol. 18, No. 35.