Enhancing the hardness of arc-ion-plated nanocrystallite TiN films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • X. Yu
  • C. B. Wang
  • Y. Liu
  • D. Y. Yu
  • S. L. Ma

Detail(s)

Original languageEnglish
Article number355710
Journal / PublicationNanotechnology
Volume18
Issue number35
Publication statusPublished - 5 Sep 2007

Abstract

Enhancing the hardness of nanocrystallite TiN films synthesized on M2 steel substrate in a vacuum cathode multi-arc ion-plating system was investigated. The synthesized film gives: (i) mean grain sizes of about 12.7 nm for TiN 111, 19.7 nm for TiN200 and 9.6 nm for TiN220; and (ii) achievable microhardness up to 45 GPa that is more than twice the 22 GPa for standard TiN film. Such hardness enhancement is anticipated as being mainly due to: (i) the formation of nanoscale crystalline grains; (ii) the preferential orientation and growth of grains in the close-packed plane (111); and (iii) induced residual stress within the film by ion bombardment. © IOP Publishing Ltd.

Citation Format(s)

Enhancing the hardness of arc-ion-plated nanocrystallite TiN films. / Yu, X.; Hua, M.; Wang, C. B.; Liu, Y.; Yu, D. Y.; Ma, S. L.

In: Nanotechnology, Vol. 18, No. 35, 355710, 05.09.2007.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review