Enhancement of process efficacy using seed plasma in pulsed high-voltage glow-discharge plasma implantation
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 67-71 |
| Journal / Publication | Physics Letters, Section A: General, Atomic and Solid State Physics |
| Volume | 303 |
| Issue number | 1 |
| Publication status | Published - 7 Oct 2002 |
Link(s)
Abstract
Pulsed high-voltage glow-discharge plasma implantation is a practical and effective surface modification technique, although the factors influencing the mechanism are still not well understood. In this Letter, we describe the use of seed plasma to alter the discharge characteristics and improve the efficiency of the process. The seed plasma is produced by an ionization gauge that is a common vacuum measurement device in plasma ion implanters. The ignition behavior of the glow discharge in the presence of seed plasma was experimentally investigated. The seed plasma induces early igniting and the impact diminishes with increasing applied voltage or working pressure. Early triggering is favorable with respect to the mitigation of arcing and the enhancement of the processing and electrical efficacy, and the phenomenon may convey useful information pertaining to the mechanism of the complicated pulsed high-voltage glow-discharge process. © 2002 Elsevier Science B.V. All rights reserved.
Research Area(s)
- Glow discharge, Ion gauge, Plasma
Citation Format(s)
Enhancement of process efficacy using seed plasma in pulsed high-voltage glow-discharge plasma implantation. / Tian, X. B.; Peng, P.; Chu, Paul K.
In: Physics Letters, Section A: General, Atomic and Solid State Physics, Vol. 303, No. 1, 07.10.2002, p. 67-71.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
