Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Original languageEnglish
Pages (from-to)3697-3700
Journal / PublicationReview of Scientific Instruments
Issue number8
Publication statusPublished - Aug 2003


Plasma immersion ion implantation (PIII) was conducted on insulating materials using a conducting grid to enhance the ion implantation energy. The implantation voltage was applied to the grid via the sample platen so that capacitance and charging effects could be alleviated. Nitrogen depth profiles were determined using secondary ion mass spectrometry.