Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials

Ricky K.Y. Fu; Xiubo Tian; Paul K. Chu

doi:10.1063/1.1588757

Author(s)

Ricky K.Y. Fu
Xiubo Tian
Paul K. Chu

Detail(s)

Original language	English
Pages (from-to)	3697-3700
Journal / Publication	Review of Scientific Instruments
Volume	74
Issue number	8
Publication status	Published - Aug 2003

Link(s)

DOI	DOI https://doi.org/10.1063/1.1588757 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0041375588&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(f42439d6-dcb2-466b-bc9d-dc80804abd85).html

Abstract

Plasma immersion ion implantation (PIII) was conducted on insulating materials using a conducting grid to enhance the ion implantation energy. The implantation voltage was applied to the grid via the sample platen so that capacitance and charging effects could be alleviated. Nitrogen depth profiles were determined using secondary ion mass spectrometry.

Citation Format(s)

[ RIS ] [ BibTeX ]

Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials. / Fu, Ricky K.Y.; Tian, Xiubo; Chu, Paul K.
In: Review of Scientific Instruments, Vol. 74, No. 8, 08.2003, p. 3697-3700.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Fu, RKY, Tian, X & Chu, PK 2003, 'Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials', Review of Scientific Instruments, vol. 74, no. 8, pp. 3697-3700. https://doi.org/10.1063/1.1588757

Fu, R. K. Y., Tian, X., & Chu, P. K. (2003). Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials. Review of Scientific Instruments, 74(8), 3697-3700. https://doi.org/10.1063/1.1588757

Fu RKY, Tian X, Chu PK. Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials. Review of Scientific Instruments. 2003 Aug;74(8):3697-3700. doi: 10.1063/1.1588757

Fu, Ricky K.Y. ; Tian, Xiubo ; Chu, Paul K. / Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials. In: Review of Scientific Instruments. 2003 ; Vol. 74, No. 8. pp. 3697-3700.